| 摘要 |
PURPOSE:To obtain homogenization or the like of a heat-treated layer, by providing a mechanism which synchronously rotates a work and a master, of the work, which is disposed in the opposite phase, and by holding the work- irradiating position and time of a laser beam to be constant. CONSTITUTION:The heat treatment apparatus which executes surface treatment with rotating a work 4 consists of a oscillation profiling mechanism, a sensor 6 for detecting the quantity of displacement with the rotation of the master 3, and a control means for controlling the rotation of the work 4 by a detected signal of this sensor 6. The above-mentioned oscillation profiling mechanism is provided with the work 4 on the side 1 and the master 3 of the work 4 on the other side so that they are disposed in the opposite phase and rotate synchronously. |
