发明名称 Semiconductor device having a superlattice structure
摘要 A semiconductor device having a plurality of laminated semiconductor layers in which a current flows in the direction of lamination. A superlattice layer is formed in at least one of the layers and the potential of the quantum well of the superlattice layer is lower than the potential of the semiconductor layer in which the superlattice layer is formed. The potential of the barrier of the superlattice layer is higher than the potential of the semiconductor layer in which said superlattice layer is formed.
申请公布号 US4796067(A) 申请公布日期 1989.01.03
申请号 US19860828254 申请日期 1986.02.11
申请人 CANON KABUSHIKI KAISHA 发明人 SHIMIZU, AKIRA;HARA, TOSHITAMI;NOJIRI, HIDETOSHI;HAKAMADA, ISAO;MIYAZAWA, SEIICHI;SEKIGUCHI, YOSHINOBU
分类号 H01L29/80;H01L21/331;H01L29/15;H01L29/201;H01L29/73;H01L29/737;H01L29/812;H01S5/00;H01S5/343;(IPC1-7):H01L27/12;H01L33/00 主分类号 H01L29/80
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