| 摘要 |
A method is described for achieving selective generation of thermal energy from a thin metal film upon exposure to microwave energy. A deactivating material is first applied to a substrate from the thin metal film in a pattern corresponding to the region from which heat is not to be generated. The metal then is applied over the substrate and the pattern in a thickness which normally generates thermal energy upon exposure to microwave energy. Such thermal energy is produced only from those regions where the metal is adhered directly to the substrate. |
