| 摘要 |
PURPOSE:To precisely regulate the amt. and pressure of a gaseous organometal to be introduced into a vacuum vessel by providing a mechanism for regulating the pressure or flow rate of the gas on the secondary side of a needle valve. CONSTITUTION:In the device for supplying a gaseous organometal into a vacuum device, the pressure, etc., are roughly regulated by the needle valve 8, and the pressure and flow rate are finely adjusted by the mechanism 10 for finely adjusting the pressure and flow rate connected to the secondary side of the valve 8. A pressure gage 14 connected to the main line A of the fine adjustment mechanism 10, a pressure controller 13 is operated by the signal from the pressure gage 14, and hence the flow regulating valve 11 of a bypass line B is operated. A vacuum pump 12 is connected to the flow regulating valve 11. The pressure of the main line is regulated by opening and closing the flow regulating valve 11 to fix the signal outputted from the pressure gage 14 and to regulated the amt. of the gas to be discharged into a vacuum pump 9. |
