发明名称 ELECTRIC RESISTANCE LAYER
摘要 PURPOSE:To suppress a blocking phenomenon in curing after coating in production and contrive a higher yield, by specifying the film thickness after drying of a thermosetting-type electric resistance layer. CONSTITUTION:An electric resistance layer, a base layer and an ink layer are provided. When the electric resistance layer is of the thermosetting type, the film thickness of the layer upon drying is up to 5.0mum. If the film thickness is more than 5.0mum, a blocking phenomenon occurs with the result of great scatter of surface resistance values, thereby causing a marked reduction in the yield. When the electric resistance layer is of a type other than the thermosetting type, for example, a thermoplastic type, no reaction takes place, so that a blocking phenomenon will not occur.
申请公布号 JPS63315297(A) 申请公布日期 1988.12.22
申请号 JP19870152012 申请日期 1987.06.18
申请人 SEIKO EPSON CORP 发明人 YAMAGUCHI YOSHITAKA
分类号 B41M5/382;B41M5/26;H01C7/00 主分类号 B41M5/382
代理机构 代理人
主权项
地址
您可能感兴趣的专利