发明名称 ION IMPLANTING APPARATUS
摘要 <p>PURPOSE:To prevent the influence of particles during wafers conveying as much as possible and to prevent the yield and quality of an IC from decreasing by providing a wafer case for shutting off the wafers from the atmosphere on the way of conveying in a conveyor system. CONSTITUTION:Unimplanted wafers are conveyed from an unimplanted wafers containing carrier 4 of a loader side to a wafer case 1 mounted at the loader side. When the case 1 contains the wafers, it is moved by driving a conveyor belt 7 with the wafers contained until they are implanted and then delivered to an implanted wafers containing carrier 5. The case 1 is opened at the side of the wafer front surfaces during the implantation, and closed after the implantation is finished to immediately shut off the implanted wafers from the atmosphere. Thereafter, the case 1 is moved to an unloader side, and the wafers are fed to the carrier 5. The three or more cases 1 are provided so as not to drop its throughput to move the conveyor from the loader side to the unloader side, or vice versa by rotation.</p>
申请公布号 JPS63312631(A) 申请公布日期 1988.12.21
申请号 JP19870148705 申请日期 1987.06.15
申请人 NEC KYUSHU LTD 发明人 ISHIJIMA TSUYOSHI
分类号 H01L21/265;H01L21/677;H01L21/68 主分类号 H01L21/265
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