发明名称 Field effect transistor with short channel length and process of fabrication thereof.
摘要 <p>For preventing a field effect transistor from the short-channel effects, there is disclosed a field effect transistor comprising a channel region (28) and source/drain regions (22 and 23) deviating form the central portion of the channel region in the lateral direction of the field effect transistor, a gate electrode (21) covered with an insulating film (27 and 28 min ) intervenes between the source/drain regions, so that the channel region is increased in length.</p>
申请公布号 EP0295643(A2) 申请公布日期 1988.12.21
申请号 EP19880109529 申请日期 1988.06.15
申请人 NEC CORPORATION 发明人 ISHIJIMA, TOSHIYUKI
分类号 H01L21/336;H01L29/423;H01L29/78 主分类号 H01L21/336
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