| 摘要 |
PURPOSE:To facilitate accurate alignment when dimensional variation exists by a method wherein the patterns of register marks and method for arranging the resister marks are specifically designed. CONSTITUTION:Relatively long partial lines directed toward the pattern center 11 of a work 10 are provided in register marks 1 on a ceramic substrate in which dimensional variation essentially exists and at least three or more register marks 1 are arranged on the work 10. On the other hand, register marks 2 are provided on a thin film mask at the positions corresponding to the register marks 1 of the substrate side so as to hold the partial lines of the register marks 1 between the register marks 2 radially to be used for alignment. Further, the dimensional discrepancy can be quantified by providing scales perpendicular to the partial lines directed toward the pattern center 11. Therefore, as the dimensional contraction by sintering in the manufacturing process of the ceramic substrate is created almost uniformly and isotropically, if the pattern center of the work is defined as an origin of coordinates, the respective points of the patterns are only shifted radially even if the variation in contraction exists. With this constitution, if a part of a radial line is utilized as a register mark, the accurate alignment can be realized. |
