发明名称 MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要 PURPOSE:To eliminate the formation of a high resistance layer on a regrown boundary and the difficulty of a regrowth by disordering the superlattice structure of a superlattice structure clad layer except a stripe by heat treating by means of impurity diffusion from a current narrowing layer. CONSTITUTION:After a current narrowing layer is formed in a buried shape except a stripe on a substrate 1, a clad layer 4, an active layer 5, a clad layer 6 and a cap layer 7 of a superlattice structure are sequentially grown on the substrate 1. Then, the superlattice structure of the layer 4 is then disordered by heat treating except the stripe by means of an impurity diffusion from the narrowing layer. Accordingly, the step of regrowing on a crystal layer having high mixed crystal ratio of exposed aluminum is eliminated. Thus, a high resistance layer is not formed on a regrown boundary and the difficulty of regrowth is eliminated.
申请公布号 JPS63310189(A) 申请公布日期 1988.12.19
申请号 JP19870145281 申请日期 1987.06.12
申请人 OKI ELECTRIC IND CO LTD 发明人 HASHIMOTO AKIHIRO;KOBAYASHI NOBUO;KAMIJO TAKESHI
分类号 H01S5/00 主分类号 H01S5/00
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