| 摘要 |
PURPOSE:To simply obtain a low-cost material for vacuum-depositing a thin SiO film with high productivity by mixing metallic Si with SiO2 and sintering the mixture. CONSTITUTION:Metallic Si powder is well mixed with SiO2 powder preferably in about 1:1 molar ratio. The powdery mixture is compacted and sintered at about 1,300 deg.C for about 2hr in a gaseous Ar atmosphere or the like to obtain a material for vacuum-depositing a thin SiO film in the form of pellets or the like. When vacuum deposition is carried out with the material, a thin SiO film having performance and strength comparable to those of a thin film obtd. by vacuum deposition with conventional SiO pellets is obtd.
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