发明名称 ETHER IMIDE-BASED COMPOUND AND PRODUCTION THEREOF
摘要 NEW MATERIAL:A compound shown by formula I (R1-R4 are H, lower alkyl, lower alkoxy, Cl or Br; R5 and R6 are H, methyl, ethyl, trifluoromethyl or trichloromethyl; R6 and R7 are H or methyl; D is 2-24C bifunctional organic group). USE:A raw material for polymer having excellent thermal flexibility resistance. PREPARATION:An ether bond-containing diamine compound {e.g. 2,2'-bis[4-(4- aminophenoxy)phenyl]propane} shown by formula II is reacted with an ethylenic unsaturated dicarboxylic acid anhydride (e.g. maleic anhydride) shown by formula III and an allylbicyclo[2,2,1]hept-5-ene-2,3-dicarboxylic acid anhydride shown by formula IV.
申请公布号 JPS63310884(A) 申请公布日期 1988.12.19
申请号 JP19870145086 申请日期 1987.06.12
申请人 HITACHI LTD 发明人 NISHIKAWA AKIO
分类号 C07D209/76;C07D403/12;C08F20/52;C08F222/00;C08F222/40;C08F299/04;C08G59/14;C08L67/06 主分类号 C07D209/76
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