发明名称 DISCHARGE DEVICE OF CVD EQUIPMENT FOR SEMICONDUCTOR MANUFACTURING
摘要 PURPOSE:To enable easily the eliminating work of clogging without interrupting an equipment, by providing a discharge flow channel with a plane type straightening means to make the flow in the discharge channel uniform, providing the straightening means with a stand-by part as well as an operating part, and switching over the position of the operating part with the position of the stand-by part when clogging occurs in the operating part. CONSTITUTION:A part of a discharge flow channel 6 is provided with a straightening means 10 constituted of a multi-hole plate 11 fixed to the exhaust flow channel 6, and a multi-hole plate 12 sliding on the multi-hole plate 11. Because the gas flowing in the discharge channel contains a large amount of reaction product produced by the reaction with a wafer, so that the reaction product gradually attaches to the straightening means, and causes clogging in the straightening means. In this case, the gas is made to flow in the stand-by part 12 by switching over mutually the positions of the operating part 11 and the stand-by part 12 of the straightening means. When the positions of the operating part 11 and the stand-by part 12 are mutually switched over, it is not necessary to interrupt a chemical vapor growth equipment, and the switching over is enabled in the midst of operation, thereby.
申请公布号 JPS63308922(A) 申请公布日期 1988.12.16
申请号 JP19870146061 申请日期 1987.06.11
申请人 HITACHI LTD 发明人 HOSHINO MASAKAZU;KOBAYASHI JUNICHI;MURAMATSU KIMIO;SATO AKIHIKO
分类号 H01L21/31;H01L21/205 主分类号 H01L21/31
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