发明名称 COLOR BEAM EXPOSURE SYSTEM
摘要 <p>PURPOSE:To prevent misregistering of exposure points from occurring, by focusing one or a plurality of light beams obtained by combining three color light beams on the surface of a photosensitive material, thereby exposing the material to light. CONSTITUTION:A beam 23MB emitted from an R (red) light-emitting diode 23M is converted into parallel rays by an optical system 23ML, and the parallel rays are transmitted through a dichroic mirror 21a, whereby the parallel rays are combined with Y (yellow) parallel rays emitted similarly from a light- emitting diode 23Y. When the combined parallel rays are transmitted through another dichroic mirror 21b, they are combined with IR (infrared) parallel rays emitted similarly from a light-emitting diode 23C, and a beam 23CMY of the resultant combined rays is focused on the surface of a color photosensitive material 12 wound around a drum 11, through a focusing optical system 22. By this system, the three color light beams 23CB, 23MB, 23YB are combined to form one beam 23CMY, which is focused, so that misregistering of exposure points is obviated.</p>
申请公布号 JPS63309474(A) 申请公布日期 1988.12.16
申请号 JP19870144973 申请日期 1987.06.10
申请人 FUJI PHOTO FILM CO LTD 发明人 MORITA NAOYUKI
分类号 B41J2/525;B41J2/44;B41J2/45;B41J2/455;B41J3/00;H04N1/23 主分类号 B41J2/525
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