| 摘要 |
PURPOSE:To contrive the improvement of a yield in a developing process by a method wherein a developing device is provided with a nozzle for feeding a foglike liquid chemical into a chamber. CONSTITUTION:A wafer 1 is placed on a turntable 2 to rotate at low speed and a pretreatment liquid is atomized through a nozzle 4. The interior of a chamber 3 is filled with the liquid brought in a foggy state and the solution is adhered uniformly on the wafer 1. A valve 9 for exhaust is shut at the time of pretreatment. A developing solution is discharged at a position just over the wafer 1 and the valve 9 is opened at the same time as a developing treatment is started to exclude forcibly the foglike pretreatment liquid in the chamber 3. In the developing of a photo resist, a developing device; which has the chamber, wherein a developing treatment is executed, and has the nozzle for feeding the foglike liquid chemical into the chamber; is used like this. Thereby, the generation of defectives in a developing process is almost eliminated and a yield in the process is improved.
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