| 摘要 |
PURPOSE:To improve precision in a processed part by a method wherein an ion beam target is positioned in reference to a processing reference mark formed same in depth as the part to he processed. CONSTITUTION:In working on a product part through irradiation with an ion beam, the spot to be irradiated is determined in reference to a processing reference mark which is exactly or approximately same in depth as the part to be beam-processed and formed after a prescribed shape. For example, a position- determining reference mark 30 is provided in one and the same layer where a first wiring, which is the product part to be processed, exists. The topmost- layer 33b correctly reflecting the shape of the reference mark 30 serves as the reference by using which positioning is accomplished. In this way, extremely high precision may be attained in the positioning of a product part to be processed even in the presence of displacement in the horizontal direction between layers involved, which ensures an accurate projection of an ion beam for a high-precision work. |
