发明名称 MEASURING METHOD OF RESIST PATTERN
摘要 PURPOSE:To enable the simple and non-contact measurement of the shape of a resist pattern (RP), by applying a coherent light on RP and by making the light diffracted by RP. CONSTITUTION:A sample 5A not subjected to heat treatment is disposed on a supporting body 6 and a laser light is applied onto the sample 5A through the intermediary of a half mirror 3. Then the laser light is reflected on the resist surface of the sample 5A and also diffracted thereby. The diffracted light is transmitted through the mirror 3 again and further through a lens 11, and a diffraction image is formed on an image sensor 12 and then outputted to an oscilloscope 13. Meanwhile the reflected light 16 is outputted as an intensi ty reference light signal (b) to the scope 13 through a photodetector 17. An image signal (a) inputted to the scope 13 is subjected to a standardizing processing on the basis of the signal (b) and thereafter to a signal processing so that data of RP be made numeric in a desired form and displayed. Next, the shape of RP of a sample 5B subjected to heat treatment is measured in the same way and compared with that the sample 5A. Then the intensity of the primary diffracted light is smaller than that of the sample 5A. According to this method, a minute variation in the shape of RP can be measured.
申请公布号 JPS63308507(A) 申请公布日期 1988.12.15
申请号 JP19870144501 申请日期 1987.06.10
申请人 FUJI PHOTO FILM CO LTD 发明人 NAYA MASAYUKI
分类号 G01B11/24;G01B11/245;G01N21/88;G01N21/93;G01N21/956;H01L21/027;H01L21/30;H01L21/66 主分类号 G01B11/24
代理机构 代理人
主权项
地址