发明名称 MASK FOR EXPOSURE
摘要 <p>PURPOSE:To attain a required pattern precision by sticking a tin oxide film onto a substrate and forming a light shielding pattern on this film to prevent functions from being hindered by light scattering due to dust stuck to the surface of an exposure mask. CONSTITUTION:A tin oxide film 3 is stuck to a substrate 1 consisting of a transparent glass plate, a transparent polyester sheet, or the like, and a light shielding pattern 2 is formed on the tin oxide film. The tin oxide film has conductibility, and an electrode is stuck to the end part of the exposure mask, which is unnecessary in the exposure process, by a conductive adhesive and is earthed to completely prevent the exposure mask from being electrified, and sticking of dust due to static electricity is surely prevented. The tin oxide has such high hardness that its surface is not flawed though being rubbed against the break surface of glass. Consequently, functions are not prevented from being hindered by light scattering due to flaws because the mask surface is scarcely flawed though being rubbed against fine powder of resin, glass, or the like.</p>
申请公布号 JPS63307460(A) 申请公布日期 1988.12.15
申请号 JP19870144249 申请日期 1987.06.10
申请人 SHIRAKAWA KOSUMOSU DENKI KK 发明人 TAKEI KEIJI
分类号 G03F1/00;G03F1/40;H01L21/027;H01L21/30 主分类号 G03F1/00
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