发明名称 CHARGED PARTICLE BEAM MONITOR
摘要 PURPOSE:To simplify the structure of a monitor and to measure an intense beam by forming a metallic film on an insulating substrate and obtaining a Faraday cup. CONSTITUTION:Holes 2 are drilled in the surface of the substrate 1 made of boron nitride which is represented as an insulator having superior machinability and heat conductivity. Then copper films 3 are formed only inside the holes 2 by vacuum vapor deposition, etc. Here, when a charged particle beam enters the Faraday cup formed of the hole 2 and copper film 3, charges are generated on the copper film 3 according to the Faraday rule and a current flows to a bolt 4 and a lead wire 6. A bias plate 7 is applied with a negative voltage to suppress a secondary voltage from the Faraday cup. Thus, the Faraday cut is formed directly in the insulating substrate and then the structure is simplified; and the whole Faraday cut contacts the insulator, so heat is easily lost from the Faraday cut and the intense beam can be measured.
申请公布号 JPS63307383(A) 申请公布日期 1988.12.15
申请号 JP19870143623 申请日期 1987.06.09
申请人 SEIKO INSTR & ELECTRONICS LTD 发明人 ISHIZAKI SHINICHI
分类号 G01T1/29;G21K5/04;H01J37/244 主分类号 G01T1/29
代理机构 代理人
主权项
地址
您可能感兴趣的专利