发明名称 ARRANGEMENT FOR PRODUCING A STRUCTURE BY MEANS OF PHOTOLITHOGRAPHY AND MANUFACTURING PROCESS THEREOF
摘要 <p>An arrangement comprises a two-layer system with photosensitive paint coats (6, 8) of a specified thickness, which contain a polymer and a photoactive compound serving as an inhibitor in an organic solvant, the adsorption capacity of which is determined by factor A, B and C. According to the invention a lower, thick layer (6) is provided with a lower absorption value and an upper, thin layer (8) with a higher absorption value, having also a different molecular weight. When the adsorption capacity is known, the thicknesses of the two photosensitive paint coatings are matched to a predetermined pure transmission. This photosensitive paint system can be used for making major topographical changes to the surface of a substrate with fine structures.</p>
申请公布号 WO1988009961(A1) 申请公布日期 1988.12.15
申请号 EP1988000143 申请日期 1988.02.26
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