| 摘要 |
PURPOSE:To prevent deterioration with lapse of time by subjecting a transparent substrate in the stage in which a lower protective film is provided thereon to sputter etching by using a gaseous medium having a low etching rate to a lower protective film forming material and a high etching rate to a transparent substrate material. CONSTITUTION:After the lower protective film 2 is provided on the transparent substrate 1, the substrate is subjected to the sputter etching by using the gaseous medium having the low etching rate to the lower protective film forming material and the high etching rate to the transparent substrate forming material; thereafter, a recording film and upper protective film are successively laminated and formed on the protective film 2. The position of the recording in contact with a micropinhole contained in the lower protective film is thereby developed as a defect and, therefore, the recording of information is executable by skipping this position. The erasing of the optical recording medium during long-period preservation is thereby eliminated and the reliability is improved.
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