ORGANIC THIN FILM AND FORMATION

摘要

PURPOSE:To prevent thermal decomposition of organic substance at a time of vapor deposition and to enhance the orientation properties and crystallizability of a thin film by dropping the prescribed amount of the organic substance on a previously heated vapor deposition boat and quickly evaporating it in vacuum and vapor-depositing it to form the organic thin film. CONSTITUTION:The inside of a vacuum tank is regulated to about 10<-8>Torr degree of vacuum and Al is vapor-deposited at about thousands Angstrom on a glass base plate 1 in a preliminary chamber 6 with a resistance heating vapor deposition device 2. Then after introducing oxygen and forming aluminum oxide with glow discharge, it is transferred to a formation chamber 5 of an organic thin film. Then argon atomic beams are subjected to impulse toward the base plate for vapor deposition from a generator of the atomic beams for shocking the base plate. The powder of N-salicylideneaniline-3-carboxylic acid is allowed to fall on a heated tungsten boat from a falling device 7 of organic substance and all amounts are quickly evaporated. Then after returning the base plate to the preliminary chamber 6, a lead electrode is vapor-deposited by using the resistance heating vapor deposition device 2.