发明名称 PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE
摘要 PURPOSE:To improve the adhesion to ink, the developability and the suitability to safelight by using an o-quinonediazido compd., novolak resin and a compd. having at least one specified structural unit in the molecular structure. CONSTITUTION:An o-quinonediazido compd., novolak resin and a compd. having at least one structural unit represented by the formula (where M is a cation and n is an integer of 3-100) in the molecular structure are used to obtain a photosensitive compsn. A photosensitive planographic printing plate is produced by forming a photosensitive layer with the photosensitive compsn. The amt. of the compd. having the structural unit in the compsn. is 0.05-10wt.%. Thus, the adhesion to ink and the over-developability can be improved without deteriorating the sensitivity or under-developability.
申请公布号 JPS63304245(A) 申请公布日期 1988.12.12
申请号 JP19870140172 申请日期 1987.06.04
申请人 KONICA CORP;MITSUBISHI KASEI CORP 发明人 SUZUKI NORIHITO;GOTO SEI;YAMAMOTO TAKESHI;TOMIYASU HIROSHI;KOBAYASHI YOSHIKO
分类号 G03C1/72;G03F7/00;G03F7/023 主分类号 G03C1/72
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