发明名称 REDUCTION PROJECTION ALIGNER
摘要 PURPOSE:To obtain a light intensity distribution corresponding to the characteristics of a semiconductor manufacturing process, on the entrance pupil of a reduction lens, by arranging a removable photodetector on the output side of a secondary light source having a conjugate relation with the entrance pupil of the reduction lens. CONSTITUTION:When a working process treated by a reduction projection aligner is changed, a ball screw 25 is rotated by operating a driving motor 30, and a one-axis table 23 is made to scan. A mercury lamp 2 in a lamp house is chucked to an XYZ stage 33 in order to adjust luminous distribution on a reticle 18 by position adjusting to an ellipsoidal mirror 1. By operating the XYZ stage 33 in Z-direction, the light intensity distribution on the output side of a secondary light source, i.e., a mixer lens group 4 can be controlled. Therefore, by repeating this Z-operation and table scan, the optimum light intensity distribution on a reduction lens entrance pupil for a specified manufacturing process of semiconductor can be obtained. Thereby, a desired light intensity distribution can be set, and the optimum image quality in each working process is obtained by one reduction projection aligner.
申请公布号 JPS63304624(A) 申请公布日期 1988.12.12
申请号 JP19870139414 申请日期 1987.06.03
申请人 HITACHI LTD 发明人 TAWA SUSUMU
分类号 H01L21/30;G03F7/20;H01L21/027 主分类号 H01L21/30
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