发明名称 REGISTERING PATTERN
摘要 PURPOSE:To improve the registering accuracy, by a method wherein a peak valve of the detected wave form of an automatic registering pattern is made large, by making the sectional structure of the registering pattern V-shaped. CONSTITUTION:On a 0.1-0.5mum thick silicon oxide film 2 on a silicon substrate 1, a registering pattern whose line width is 1-5mum is formed. The sectional structure of the registering pattern 3 is V-shaped, and the inclination angle thetais 10-80 deg.. In such a V-shaped groove pattern 3, the wave form of a reflected light 5 of light irradiation becomes darker at the pattern part than the other part, and the degree of darkness becomes a single mountain type from the pattern end-portion to the central part. Thereby, the automatic registering applying a registering exposing machine is easily and accurately performed.
申请公布号 JPS63304625(A) 申请公布日期 1988.12.12
申请号 JP19870140237 申请日期 1987.06.03
申请人 NEC CORP 发明人 YAMADA KOJI
分类号 H01L21/68;G03F9/00;H01L21/027;H01L21/30 主分类号 H01L21/68
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