| 摘要 |
PURPOSE:To reduce the consumption of liq. chemicals and to improve washing efficiency as well as to uniformly treat a large-sized substrate in photo-etching process, by horizontally supporting the substrate on a holding table in a treating tank and fitting an inclining means to a substrate transferring device so as to incline the substrate when the substrate is carried out of the tank. CONSTITUTION:A substrate 1 is horizontally put on a holding table 3 in a treating tank 2. A transferring device 4 grasps the substrate 1 through the arms 5a, 5b and transfers the substrate 1 vertically and horizontally. When an air cylinder 12 connected to the auxiliary base 9 of the device 4 is worked, the base 9 moves upward from the shaft 14 of the connecting plate 11 as the center, the substrate 1 held by the arms 5a, 5b is inclined and liq. chemicals on the substrate 1 are recovered in the tank 2. Since the liq. chemicals are hardly brought in the subsequent washing stage, the substrate 1 can be effectively washed.
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