发明名称 PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE PLANOGRAPHIC PLATE
摘要 PURPOSE:To improve the chemical resistance of the titled composition by incorporating an o-quinone diazide compd., a novolak resin, a vinyl type polymer having a phenolic hydroxyl group and a polymer composed of a specific polyoxyethylene, etc., in the titled composition. CONSTITUTION:The titled composition comprises the o-quinone diazide compd. (a), the novolak resin (b), the vinyl type polymer (c) having the phenolic hydroxy group and the polyoxyethylene polymer or the polyoxy propylene polymer (d) having formulas I and II in a molecular structure. In formulas I and II, (n) is 2-5,000. And, the titled plate is obtd. by applying the titled composition on a supporting plate as a photosensitive layer. Accordingly, the chemical resistance, the over development, and the ball pen aptitude of the titled plate are improved, and the ink forming and shelf life properties of said plate are improved.
申请公布号 JPS63303343(A) 申请公布日期 1988.12.09
申请号 JP19870139140 申请日期 1987.06.03
申请人 KONICA CORP;MITSUBISHI KASEI CORP 发明人 NAKAI HIDEYUKI;GOTO SEI;TOMIYASU HIROSHI;KOBAYASHI YOSHIKO
分类号 G03C1/72;G03F7/00;G03F7/022;G03F7/023 主分类号 G03C1/72
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