| 发明名称 |
Method of projecting photoelectron image |
| 摘要 |
A method for projecting a photelectron image includes providing a mask substrate, and selectively contacting a layer which lowers the work function of the mask substrate thereto. Photoelectrons are emitted from the contacted portion.
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| 申请公布号 |
US4789786(A) |
申请公布日期 |
1988.12.06 |
| 申请号 |
US19880144275 |
申请日期 |
1988.01.15 |
| 申请人 |
FUJITSU LIMITED |
发明人 |
YASUDA, HIROSHI;HONJO, ICHIRO |
| 分类号 |
G03F7/20;H01J37/317;(IPC1-7):H01L21/30 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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