发明名称 |
Method for fabricating low loss crystalline silicon waveguides by dielectric implantation |
摘要 |
A method of fabricating low loss silicon optical waveguides by high energy ion implantation which converts a buried region into dielectric material. The top silicon surface can them be etched or formed into waveguides that are isolated by the buried dielectric. Annealing of the top silicon layer can be used to improve optical quality and additional silicon can be added to the top surface waveguides by epitaxial growth.
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申请公布号 |
US4789642(A) |
申请公布日期 |
1988.12.06 |
申请号 |
US19870032810 |
申请日期 |
1987.03.26 |
申请人 |
THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE |
发明人 |
LORENZO, JOSEPH P.;SOREF, RICHARD A. |
分类号 |
G02B6/134;(IPC1-7):H01L21/425;G02B6/10 |
主分类号 |
G02B6/134 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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