| 摘要 |
PURPOSE:To prevent the exfoliation of a conductive film from a master disk by changing the ratios at which a specific individual metal and the nitride of this metal are splashed. CONSTITUTION:The conductive film is formed by simultaneously splashing the independent metal of at least one kind selected from Ti, Zr, V, Nb and Cr and the nitride of the selected metal toward the nonmetallic master disk. The ratios at which the individual metal and the nitride of the metal are splashed are so changed that the conductive film has the compsn. contg. the nitride of the metal at a higher ratio in the position near the nonmetallic master disk and contg. the individual metal at the gradually increasing ratio on progression of the film formation at this time. The fitting between the conductive film and the nonmetallic master disk is thereby improved and the exfoliation of the film from the master disk at the time of forming this film or at the time of forming the main layer of a stamper by an electrodeposition method is prevented.
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