| 摘要 |
PURPOSE:To clean a base plate by projecting the ionized particles in hydrogen plasma on the base plate under the control of specific kinetic energy, thereby reducing the contaminant on the base plate into a gaseous compound having high partial pressure and giving a sputtering working on the contaminant. CONSTITUTION:Hydrogen is converted into plasma and the kinetic energy of the ionized grains is said plasma is regulated to 50-300eV. Said regulated ionized particles are projected on the base plate to reduce the contaminant on the base plate into a gaseous compound having high partial pressure. At the same time, said contaminant is subjected to spattering working and is physically removed away.
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