发明名称 |
PROTECTIVE SHEET FOR WAFER GRINDING; GRINDING OF WAFER FACE USING SAID SHEET |
摘要 |
PURPOSE:To remove an adhesive adhered to the surface of a wafer by washing it by water after a grinding operation has been completed by forming a layer of the prescribed adhesive on the surface of a substrate. CONSTITUTION:A protective sheet 1 for wafer grinding use is composed of a substrate material 2 and a layer 3 of an adhesive coated on the surface of this material. This layer 3 of the adhesive contains at least the following: a partially cross-linked substance of a hydrophile polymer containing a carboxyl group whose one part is neutralized partially; an anion surfactant and a cation surfactant. By this setup, it is possible to remove the adhesive adhered to the surface of a wafer by washing it by water without using an organic solvent such as Triclene or the like after a grinding process has been completed.
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申请公布号 |
JPS63296222(A) |
申请公布日期 |
1988.12.02 |
申请号 |
JP19870130829 |
申请日期 |
1987.05.27 |
申请人 |
F S K KK;HOECHST GOSEI KK |
发明人 |
FUKAZAWA YUJI;KIMIMURA TAKAYOSHI;EBE KAZUYOSHI;NARITA HIROAKI;TAGUCHI KATSUHISA;AKEDA YOSHITAKA;SAITO TAKANORI |
分类号 |
H01L21/304;C09J7/02 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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