发明名称 PROTECTIVE SHEET FOR WAFER GRINDING; GRINDING OF WAFER FACE USING SAID SHEET
摘要 PURPOSE:To remove an adhesive adhered to the surface of a wafer by washing it by water after a grinding operation has been completed by forming a layer of the prescribed adhesive on the surface of a substrate. CONSTITUTION:A protective sheet 1 for wafer grinding use is composed of a substrate material 2 and a layer 3 of an adhesive coated on the surface of this material. This layer 3 of the adhesive contains at least the following: a partially cross-linked substance of a hydrophile polymer containing a carboxyl group whose one part is neutralized partially; an anion surfactant and a cation surfactant. By this setup, it is possible to remove the adhesive adhered to the surface of a wafer by washing it by water without using an organic solvent such as Triclene or the like after a grinding process has been completed.
申请公布号 JPS63296222(A) 申请公布日期 1988.12.02
申请号 JP19870130829 申请日期 1987.05.27
申请人 F S K KK;HOECHST GOSEI KK 发明人 FUKAZAWA YUJI;KIMIMURA TAKAYOSHI;EBE KAZUYOSHI;NARITA HIROAKI;TAGUCHI KATSUHISA;AKEDA YOSHITAKA;SAITO TAKANORI
分类号 H01L21/304;C09J7/02 主分类号 H01L21/304
代理机构 代理人
主权项
地址
您可能感兴趣的专利