发明名称 HIGH VOLUME CRYSTAL PLATING APPARATUS AND METHOD
摘要 A high crystal plating apparatus (50) includes a carousel (90) with fingers (92) and a mask (110) for holding and masking twenty or more crystals (204) in circuits (200) within a vacuum chamber (52). Each circuit (200) is sequentially positioned to allow plating of a crystal (204) and measurement of its frequency. The mask (110) has an alignment peg (112) adapted to fit into alignment hole (102) on the back (94) of the carousel to allow the mask to fit within the fingers (92), so that the tapered apertures (116) of the mask are positioned correctly for the plating. In the method of using the apparatus (50), plating is terminated when a desired value of crystal frequency is measured. A contactor (230) accepting variable thickness pins or lead wires can be used to establish electrical contact for measuring crystal frequency.
申请公布号 WO8809223(A1) 申请公布日期 1988.12.01
申请号 WO1988US01810 申请日期 1988.05.26
申请人 EMKAY MANUFACTURING COMPANY 发明人 KAPLAN, ALAN, S.;ROBERTSON, SAMUEL, E.;MASKREY, ALFRED, E.;MATTEO, AUGUSTINO, JR.
分类号 C23C14/04;C23C14/54;C30B33/00;H01L21/68;(IPC1-7):B05D5/12;C23C16/04;B05C13/02;B05D1/32;H01R4/52;C23C16/52 主分类号 C23C14/04
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