发明名称 METHOD FOR EVALUATING DEVELOPING PROCESS
摘要 PURPOSE:To stably obtain a fine latent image pattern, and to easily evaluate a developing process by forming evaluation pattern consisting of a conductive thin film on a dielectric body and obtaining an electrostatic latent image corresponding to the pattern. CONSTITUTION:A dielectric layer 2 is formed on conductive metallic substrate 1 and a thin conductive layer 3 from which a part corresponding to an evaluation pattern is removed is formed on the layer 2. The surface of the layer 3 is uniformly charged by an electrostatic charger 4 and then the charged layer 3 is earthed through a switch 5 or the like to discharge the charge of the layer 3 and to form a stable latent image. The latent image is developed by using the developing device 6 set in the developing condition to be evaluate, and evaluated. Said constitution makes it possible to easily evaluate a developing process by a fine latent image pattern and to improve the reliability of evaluation.
申请公布号 JPS63293570(A) 申请公布日期 1988.11.30
申请号 JP19870129029 申请日期 1987.05.26
申请人 FUJITSU LTD 发明人 SATO KUNIHIKO
分类号 G03G15/08 主分类号 G03G15/08
代理机构 代理人
主权项
地址