发明名称 PLATING METHOD
摘要 PURPOSE:To form a dense and uniform plated film free from surface detects such as pinholes by sticking a reducing agent for a plating metal to the surface of a member to be plated, putting the member into a plating soln. and carrying out electroless plating. CONSTITUTION:The surface of a substrate of Al, an Al alloy or the like is degreased and subjected to zinc substitution treatment. The substrate is immersed in a soln. of a reducing agent such as sodium hypophosphate and the surface of a zinc film formed by substitution is activated. The substrate is then put in a plating soln. and electroless plating with Ni-P or the like is carried out. The reduction of ions of a plating metal during electroless plating is accelerated and a dense and uniform plated layer is formed.
申请公布号 JPS63293170(A) 申请公布日期 1988.11.30
申请号 JP19870128993 申请日期 1987.05.26
申请人 BROTHER IND LTD 发明人 SAWAIRI TOSHIO;MIYATA MASAYUKI
分类号 C23C18/16;C23C18/18;C23C18/34;C23C18/36;C23C18/52 主分类号 C23C18/16
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