发明名称 STRUCTURAL BODY OF TARGET
摘要 PURPOSE:To apply directivity to sputtered film particles so that films having high reliability are formed in recesses by working groove parts to the consuming region of a target and mounting a suppressor electrode via a specific spacing on the reference pane of the target. CONSTITUTION:The concentrical grooves 101 as recesses are worked to the surface having the consuming region of the target 1 and the direction of the sputtered film particles flying from the base of the grooves 101 are limited by side walls 104 of the grooves 101. The suppressor electrode 102 is disposed to the reference plane 103 of the target via the spacing which is determined by a potential difference between the electrode 102 and the target surface and the pressure of an inert gas and at which sputtering does not arise. The plasma in the sputtered films is thereby restrained in the grooves 101 and the sputtering arises at the higher density than on the reference plane of the target. The good formation of the films in the microrecesses is thereby enabled and the film formation with the good step covering characteristic is enabled.
申请公布号 JPS63293161(A) 申请公布日期 1988.11.30
申请号 JP19870128154 申请日期 1987.05.27
申请人 HITACHI LTD 发明人 SHIMAMURA HIDEAKI;KAWAHITO MICHIYOSHI;SAKATA MASAO;KOBAYASHI HIDE;KAMEI TSUNEAKI
分类号 C23C14/34 主分类号 C23C14/34
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