| 摘要 |
PURPOSE:To stably deposit a high quality film at a high rate by monitoring the effective power of microwaves in a film forming space and maintaining the intensity of plasma in a desired state according to the monitored power. CONSTITUTION:Discharge luminance detectors 103, etc., are fitted to a reaction furnace 101, plasma generated in a discharge space 106 is monitored through a peep window 112 and the output signal is inputted in a control part 115. When the intensity of plasma varies, matching is automatically carried out with tricolumnar adjusters 109 according to the output signal so that the intensity of plasma at the beginning of discharge is maintained. Thus, a homogeneous film of a uniform thickness is deposited on a substrate 105. |
