发明名称 SCANNING PHOTON MICROSCOPE
摘要 PURPOSE:To improve the sensitivity of the detection of a contaminated part on the surface of a semiconductor wafer or a defective which is present locally by performing the synchronous phase detection of an AC light voltage in the semiconductor wafer surface and subtracting a DC component contained in the distribution of a light voltage with an effective value. CONSTITUTION:When light which becomes intermittent light of frequency through brightness modulation is projected on the semiconductor wafer 14, the AC light voltage is generated. This voltage can be detected by the electrostatic capacity consisting of the wafer 14 and a transparent electrode 15 without forming any electrode on the wafer 14. The detected AC light voltage is controlled to the effective value of the AC voltage of a synchronous phase detector 24 and inputted to a signal processing circuit 6. The signal after the contrast is emphasized by this circuit 6 is A/D-converted 7 and stored in a frame memory 9 through the interface circuit 8 of a microcomputer 12. The light spot of a CRT 18, on the other hand, is scanned at a spot position by the deflecting coil 19 of a deflection driving circuit 21 according to a signal from an oscillator 23. Consequently, information in the plane of a wafer 14 is stored in a memory 9 and this information is displayed 11 through a scan converter 10 to obtain a light voltage distribution image.
申请公布号 JPS63293453(A) 申请公布日期 1988.11.30
申请号 JP19870128303 申请日期 1987.05.27
申请人 HITACHI LTD;HITACHI ELECTRONICS ENG CO LTD 发明人 HONMA NORIAKI;MUNAKATA TADASUKE;KONAME KANJI;SHIMIZU HIROBUMI;KATO NOBORU
分类号 G01N23/227;G01N21/88;G01N21/94;H01L21/66 主分类号 G01N23/227
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