发明名称 HEAT TREATMENT DEVICE
摘要 PURPOSE:To form a resist pattern stably with high accuracy between mutual substrates or to the inside of the substrates by making a supporting plate 2 where the substrate is placed approach or brought into contact with a block for heating or cooling from the lower side, thereby heating or cooling it alternately. CONSTITUTION:The heat is conducted to a supporting plate 2 where a substrate is placed by making a heating plate 32 which is in advance heated by lifting operation with the aid of rotation of a screwshaft 34 approach as near the plate 2 for supporting substrate as possible or come into close contact with its plate so as to conduct the heat. A shutter 4 which is used to prevent radiant heat in order to protect the cooling block from the heat radiated by the heating block is mounted at a lower part of driving device 55. Thus, when the substrate is cooled, this device moves a cooling block horizontally up to a lower part of the supporting plate 2 by an horizontal moving driving device 56 and allows its cooling block 52 to approach as near a lower plane of the supporting plate 2 as possible or to come into close contact with its lower plane by lifting a cooling plate 52 mounted to a cooling plate fixing stand 53.
申请公布号 JPS63291419(A) 申请公布日期 1988.11.29
申请号 JP19870126432 申请日期 1987.05.24
申请人 TATSUMO KK 发明人 SHIDAHARA HITOSHI;YAMAMOTO MASAHARU
分类号 H01L21/304;B05C9/14;G03F7/16;G03F7/38;H01L21/027;H05K3/06 主分类号 H01L21/304
代理机构 代理人
主权项
地址