发明名称 |
X-ray exposure system |
摘要 |
An X-ray exposure system including a plurality of X-ray exposure apparatuses each for duplicating a mask pattern on a semiconductor wafer by irradiating an X-ray mask and the semiconductor wafer with synchrotron radiation is disclosed in which a synchrotron radiation path branching device including a reflecting mirror is disposed between a synchrotron ring and the X-ray exposure apparatuses, and the propagation direction of the synchrotron radiation emitted from the synchrotron ring is changed by the reflecting mirror so that the synchrotron radiation from the ring can be introduced into each of the X-ray exposure apparatuses.
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申请公布号 |
US4788698(A) |
申请公布日期 |
1988.11.29 |
申请号 |
US19870028024 |
申请日期 |
1987.03.17 |
申请人 |
HITACHI, LTD. |
发明人 |
KIMURA, TAKESHI;MOCHIJI, KOZO;ASAI, SHOJIRO;OBAYASHI, HIDEHITO |
分类号 |
G03F7/20;(IPC1-7):G21K5/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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