发明名称 |
Photoresist composition comprising an interpolymer of a silicon-containing monomer and an hydroxystyrene |
摘要 |
A photoresist composition comprises a photosensitive compound and an interpolymer of a silicon-containing monomer and an hydroxystyrene. The resist composition exhibits superior thermal stability and dissolution rate and good resistance to an oxygen plasma etch.
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申请公布号 |
US4788127(A) |
申请公布日期 |
1988.11.29 |
申请号 |
US19860931495 |
申请日期 |
1986.11.17 |
申请人 |
EASTMAN KODAK COMPANY |
发明人 |
BAILEY, DAVID B.;FELDMAN, MICHAEL M. |
分类号 |
G03F7/039;G03F7/038;G03F7/075;(IPC1-7):G03C1/60;G03C1/727 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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