发明名称 METHOD AND APPARATUS FOR PRODUCING MULTI-LAYERED COMPOUND FILM
摘要 PURPOSE:To easily form multi-layered films of compds. consisting of plural components by periodically moving a shutter having plural window holes or notches for constituting elements over plural pieces of vapor sources contg. the constituting elements. CONSTITUTION:Plural pieces of the metal targets 11-14 contg. the constituting elements are separated and disposed at equal intervals and are so inclined that the respective axial lines face a substrate 15. A sheet of the shutter 16 provided with at least two pieces of the window holes 16a, 16b on the circular conical side face orthogonal with said axial lines is disposed above the targets 11.... DC voltages are impressed from power supplies 11a-14a respectively to the targets 11-14 of the sputtering device constituted in the above-mentioned manner to execute DC magnetron sputtering. The shutter 16 is periodically rotated around the axis 16c of rotation simultaneously therewith. The compd. film layers consisting of at least two kinds of the elements are thereby alternately laminated in multiple layers on the surface of the substrate 15, by which the multi-layered compd. films are obtd.
申请公布号 JPS63290257(A) 申请公布日期 1988.11.28
申请号 JP19870124511 申请日期 1987.05.20
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 ADACHI HIDEAKI;TONO HIDETAKA;MITSUYU TSUNEO;YAMAZAKI OSAMU
分类号 C23C14/06;C23C14/34 主分类号 C23C14/06
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