| 摘要 |
PURPOSE:To simplify a paralleling of a mask and a substrate, to prevent a direct contact between the lower surface of the mask and the surface of the substrate and to improve the yield of product by bringing the mask into contact with the substrate through a spacer whose thickness is equal and making one of them copy another. CONSTITUTION:A substrate chuck 15 is provided on a paralleling stage 11 and the entire tilt of the substrate chuck 15 is adjusted by the paralleling stage 11, so that the paralleling of the substrate and the mask is executed. Namely, by bringing the mask 12 into contact with the substrate 30 through the spacers 14a and 14b whose thickness is equal and making one of them copy another, the paralleling of them can be easily executed and the lower surface of the mask 12 does not directly bring into contact with the surface of the substrate 30. As a result, a defect caused by the peeling of a resist pattern on the upper surface of the substrate 30 does not occur and a foreign matter on the substrate 30 side does not adhere to the mask 12, so that the yield of product can be improved and setting a space between the mask 12 and the substrate 30 can be made easy.
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