发明名称 DETECTION OF FOREIGN MATTER ON X-RAY EXPOSURE MASK
摘要 PURPOSE:To enable the detection of very minute foreign matter on an X-ray exposure mask for which a pellicle is difficult to be used, by irradiating the X-ray exposure mask with light having a specified wavelength from an organic film side, and detecting the foreign matter by discriminating whether a scattered light exists or not. CONSTITUTION:On an X-ray mask 2, an organic film 11, e.g., PIQ (Polyimide- isoindoloquinazolinedione) is spread, and light 13 whose wavelength is shorter than or equal to 380 nm is projected from above the film. The light which irradiates the PIQ film is absorbed, but the light which collides against the foreign matter 5 generates scattered light 21. The mask 2 coated with this organic film 11 is set on a stage 12 which moves in one axis direction, and transferred in an arrow direction 19. By deflecting a laser spot 18 in the scanning direction 20 with a galvamirror 16, the laser spot 18 scans the whole surface on the mask 2. Therefore, the minute foreign matter 5 can be detected, by detecting the scattered light 21 with a scattered light detector 17. Thereby, the detection of very minute foreign matter on the X-ray exposure mask for which a pellicle is difficult to be used, is enabled.
申请公布号 JPS63289814(A) 申请公布日期 1988.11.28
申请号 JP19870123639 申请日期 1987.05.22
申请人 HITACHI LTD 发明人 AKIYAMA NOBUYUKI;KUNI TOMOHIRO
分类号 G01N21/88;G01N21/94;G01N21/956;G03F1/00;G03F1/22;G03F1/68;H01L21/027;H01L21/30;H01L21/66 主分类号 G01N21/88
代理机构 代理人
主权项
地址