发明名称 ELECTRON IMPACT, FIELD EMISSION TYPE ION SOURCE
摘要 PURPOSE:To stabilize ion current by providing a control electrode between an auxiliary electrode and an ion source, electrically connecting such control electrode and auxiliary electrode and disposing a self-bias resistance in the course of connection between such connecting point and ion source. CONSTITUTION:A control electrode 13 is disposed between a chip 2 and an auxiliary electrode 7, it is electrically connected with the auxiliary electrode 7 and a self-bias resistance 14 is inserted in the course of the connection between such connecting point and an acceleration electrode 8. When the chip 2 is irradiated with the electron beam 10 and the ion beam 11 is released, temperature of chip 2 changes due to the electron beam 10 generated from the filament, a emitted ion current i becomes i+ or -DELTAi because of a change as much as + or -DELTAi. This current flows through a bias resistance 14, controlling a voltage of control electrode 13 for the chip 2. Thereby, an ion current can be stabilized.
申请公布号 JPS5978431(A) 申请公布日期 1984.05.07
申请号 JP19820187784 申请日期 1982.10.26
申请人 HITACHI SEISAKUSHO KK 发明人 TAMURA HIFUMI;ISHITANI TOORU
分类号 H01J37/08;H01J27/20;H01J27/26 主分类号 H01J37/08
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