发明名称 PHOTOSENSITIVE FILM COMPOSITION
摘要 PURPOSE:To obtain the title composition excellent in adhesion, heat resistance and storage stability, by mixing a specified reaction product with an ethylenically unsaturated compound, a sensitizer, an epoxy resin and a curing agent. CONSTITUTION:A reaction product (A) of an acid number <=20 is obtained by reacting an epoxy resin having at least two terminal epoxy groups with an unsaturated carboxylic acid having 1.0-2mol., per epoxy equivalent, of ethylene bonds (e.g., acrylic acid) at 60-120 deg.C in the presence of a polymerization inhibitor and an esterification catalyst. Component A is mixed with 0.5-60wt.% unsaturated compound (B) having at least two ethylene bonds (e.g., polyethylene glycol diacrylate), 0.1-10.0wt.% sensitizer (C) (e.g., 2-t- butylanthraquinone), 3-50wt.% epoxy resin (D) and 0.1-30.0wt.% epoxy resin curing agent (e.g., ethylenediamine).
申请公布号 JPS63289014(A) 申请公布日期 1988.11.25
申请号 JP19870125253 申请日期 1987.05.21
申请人 TAMURA KAKEN KK 发明人 OKUYA TAKESHI;ONO TAKAO
分类号 C08G59/17;C08G59/00;C08G59/18;C08G59/40;C08L63/00;G03F7/031;G03F7/032 主分类号 C08G59/17
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