| 摘要 |
PURPOSE:To control the shape of the pregrooves of a substrate by controlling the thickness distribution of a photoresist and etching both the photoresist and the substrate. CONSTITUTION:The photoresist 2 is spin-coated on the substrate 1 consisting of a metal and the oxide or nitride thereof and is concentrically or spirally exposed by laser light. Exposed parts 3 having inclinations are obtd. if exposing conditions are adequately selected. A photoresist layer 2 having inclinations is similarly obtd. after development. The substrate 1 is etched first from the part where the photoresist layer is thin when the substrate 1 and the photoresist 2 are subjected to plasma etching in the state in which gases for etching are respectively mixed. The grooves 4 having the shape corresponding to the thickness distribution of the photoresist layer are formed in the final on the substrate 1. The stamper having the pregrooves capable of controlling the shape of the grooves is thereby formed and the formation is executable by the integrated dry process.
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