| 摘要 |
PURPOSE:To prevent attachment of dust on the surface of a sample due to falling caused by gravity and to obtain the clean sample, by constituting a sample stage so that the surface of a sample is inclined at about 90 degrees or larger to a horizontal plane. CONSTITUTION:A reaction box 1 of a resist removing apparatus is sealed in a airtight manner. Reaction gas is inputted through a gas feeding port 4 and exhausted through a gas exhaust port 5. The reaction gas is made to be O2, O3, N2O, NO2 or the like. Ultraviolet rays are generated from lamps 2, which are arranged in a metal box 11 in the reaction box 1. A sample 6 is attached to a sample stage 3. A microwave oscillator 10 is coupled to the metal box 11 through a waveguide 9. A small holes 7 are opened in the sample stage 3. The sample 6 is mounted with atmospheric pressure. A rotary mechanism and the like are included in the sample stage 3 so that uniformity is provided. The sample stage 3 is fixed so that the surface of the sample 6 is inclined at about 90 degrees or larger to a horizontal plane. The reaction gas is decomposed with the ultraviolet rays from the lamps 2. The resist of the sample 6 is removed with the exciting atoms of oxygen. The attachment of dust and the like on the surface due to gravity is prevented.
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