| 摘要 |
PURPOSE:To ensure the removal of an etching resistant layer and to prevent blocking caused by the sticking of the removed resistant layer by removing the etching resistant layer by alkali treatment and warm water spraying after two-stage etching and by removing a resist layer. CONSTITUTION:Resist films 4 having metal exposed parts 6 are formed on both sides of a thin metallic sheet 1, a protective film 8a is stuck to the film 4 having the larger exposed part 6 and the sheet 1 is etched with the film 8a upward to form a small recess 9. The side having the recess 9 is washed and an NaOH soln. is sprayed to remove the film 4. The film 8a is removed, epoxy resin varnish is applied to the side having the recess 9 to form an etching resistant layer 10 and a protective film 8b is stuck to the layer 10. The sheet 1 is etched again with the film 8b upward to form a large recess 11 leading to the recess 9, the side having the recess 11 is washed and the film 8b is removed. An NaOH soln. is sprayed on the central part of the exposed layer 10 to swell the layer 10 and the swollen layer 10 is removed by spraying warm water. The NaOH soln. is further sprayed on the residual film 4 to remove the film 4.
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