| 摘要 |
PURPOSE:To make the size of each treating unit to be minimum and to make the arrangement between the units free, by giving and receiving wafers between a plurality of units, which are independently arranged and perform resist application and development, with a transfer robot, which receives commands from a controller. CONSTITUTION:Wafers are picked up one by one from a cassette, on which the semiconductor wafers are mounted, in a cassette giving and receiving part 1a of a resist application and development apparatus. The wafers are sent to an application unit 2a with a transfer robot 8. After the required treatment is performed in the unit 2a, the robot 8 recovers the wafers and sequentially sends the wafers to backing units 3a-3d and recovers them. After the treatments in the units 3a-3d are finished, the wafers, whose treatments are all finished, are stored in the cassette. A controller 9 always monitors the treatment units 3a-3d and a development unit 6a and gives a transfer command to the robot and treatment conditions to the unit 3a-3d and 6a. |
