| 摘要 |
<p>A method of manufacturing a shadow mask, comprising the steps of forming a first resist pattern (14b) having a large number of openings (16b) on one major surface of a thin metal plate (11) and a second resist pattern on the other major surface, the second resist pattern (14a) having a large number of openings (16a) with an opening size large than that of the first resist pattern (14b), etching the thin metal plate surface having the first resist pattern (14b) to form first recesses (19), removing the first resist pattern (14b), forming an etching-resistive layer (20) on the thin metal plate surface having the first recesses (19) to fill the first recesses (19), etching the thin metal plate surface having the second resist pattern (14a) to form second recesses (21) which have a size larger than that of the first recesses (19) and communicate with the first recesses (19), treating and swelling the etching-resistive layer (20) with an alkali solution, spraying warm water to the etching-resistive layer (20) to remove the etching-resistive layer (20), and removing the second resist pattern (14a).</p> |
